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OPTIhot SHT30+ - Hotplate

OPTIhot SHT30+ - Hotplate

  • Product Information

    The future technology in the semi conductor industry and production-
    stand alone Hotplate System for typical lithography baking applications:

    OPTIhot SHT 30+

    • Stand Alone Hotplate System for wafer up to Ø 8" 
        (Ø 200 mm) and substrates up to 6" x 6" (150 mm x 150mm)

    System consists of:

    • Stand Alone Cabinet with integrated Hotplate and controller
    • Recipe programmable lifting pins (proximity) for 4" - 12" wafer 
    • Recipe programmable Nitrogen (N2) blow
    • Input display unit with touch panel
    • Preset and calibrated Temperature Controller
    • Including software for PC / Notebook - For more comfortable recipe writing and storage
    • Including an ENGLISH manual on standard paper and a CD-ROM
    • Price without installation and training

    Technical data:

    • Voltage: UAC= 110 V / N / PE / 60 Hz / 16A or UAC= 230 V / N / PE / 50 Hz / 16A
    • Temperature range: Up to 300°C - Adjustable in 1°C steps
    • Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
    • Lifting pins (Proximity): From Ø 4" up to Ø 12" - Programmable in 0.1 mm steps
    • Substrate size: Up to Ø 12" (Ø 300 mm) or 9" x 9" (225 mm x 225 mm)
    • Process exhaust: Outer diameter OD 110 mm, 30m3/h
    • Cabinet exhaust: Outer diameter OD 110 mm, 200m3/h
    • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
    • Vacuum: -0.8 ± 0.2 bar
    • Nitrogen (N2): 4.0 ± 0.5 bar
    • CE marked system

This is a customizable product with a very large amount of options available. Please contact our sales department for more information and support to get a product customized to your needs.

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