Maximus 802 - Automatic Cluster

The future technology in the semi conductor industry and production-
fully automatic and programmable cassette-to-cassette micro-cluster system:

MAXIMUS 802 Micro system

• Automatic Spin Coating and Developing System, with Hotplates
  for wafers up to Ø 8" (Ø 200mm) or substrates up to 6" x 6"
  (150mm x 150mm)

The System consists of:

• 1 Cabinet MAXIMUS 802
• 1 3-axis robot
• 1 End effector vacuum standard for Ø 125mm and Ø 150mm wafer
• 1 Flat touch screen monitor
• 1 Computer as controller and user interface
• 2 Cassette loading plates for wafer up to Ø 8"cassettes as I/O
• 1 Touch less video pre-alignment for wafers up to Ø 8"
• 1 Light beacon (red , yellow , green )
• 1 Remote control, for quick log file checking for service and maintenance purposes via modem or ISDN interface
• 1 Software for easy programming of station recipe and flow recipe
• at the system or on a connected PC
• 1 CE marked system
• 1 ENGLISH manual on standard paper and a CD-ROM

Technical Data:

• Voltage: UAC= 3 x 400 V / N/PE/50 Hz/16A
• Spinner System: Motor speed: 1 up to 10,000rpm in 1rpm steps (depending on substrate size and load)
• Motor acceleration ramp: 1 up to 50,000 rpm/sec in steps 1rpm/sec (depending on substrate size and load)
• Spinning time: 0.1 up to 999sec in 0.1sec steps 
• Process bowl: Standard made of Polypropylene (PP)
• Standard drain: 5 liter waste tank with high-level sensor inside the cabinet
• Pressure: Clean Dry Air (CDA) 8 ± 2 bar
• Vacuum: -0.8 ± 0.2 bar
• Nitrogen N2 (optional): 4.0 ± 0.5 bar
• Exhaust connection spinner module: OD110mm, 200m3/h
• Exhaust connection hotplate stacker: OD110mm, 200m3/h
• Exhaust connection cabinet: OD110mm, 200m3/h
• Exhaust connection controller: OD110mm, 200m3/h