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OPTIhot VB20 - Hotplate HMDS

OPTIhot VB20 - Hotplate HMDS

  • Product Information

    The future technology in the semi conductor industry and production-
    HMDS hotplate module for typical HMDS wafer priming and dehydration bake lithography applications:

    OPTIhot VB 20

    • Bench Mounted HMDS (HexaMethylDiSilazan - C6H19NS 2)
      Vapor Prime Hotplate System for wafer up to Ø 8" (Ø 200 mm)
      and substrates up to 6" x 6" (150 mm x 150 mm) with
      programmable process parameter (HMDS, Nitrogen and Vacuum)

    System consists of:

    • Hotplate System with vacuum chamber and cover 
    • Process media dosing unit and controller 
    • Input display unit with touch
    • Profiled and calibrated to Temperature Controller before shipment
    • Including software for PC / Notebook - For more comfortable
    • recipe writing and storage
    • Including an ENGLISH manual on standard paper and a CD-ROM
    • Price without installation and training

    Technical data:

    • Voltage: UAC= 110 V / N / PE / 60 Hz / 16A or UAC= 230 V / N / PE / 50 Hz / 16A 
    • Temperature range: Up to 200°C - Adjustable in 0.1°C steps
    • Hotplate time: 1 up to 999 s - Adjustable in 0.1 s steps
    • Programmable process: HMDS, Nitrogen (N2), Vacuum parameter
    • Substrate size: Up to Ø 8" (Ø 200 mm) or 6" x 6" (150 mm x 150 mm)
    • Process exhaust: Outer diameter OD 38mm, 30m3/h
    • Compressed air: Clean Dry Air (CDA) 8 ± 2 bar
    • Vacuum: -0.8 ± 0.2 bar
    • Nitrogen (N2): 4.0 ± 0.5 bar
    • CE marked system

    Options

    • "5 liter HMDS / N2 bubbler tank system stainless steel tank complete with pressure regulator and tubing exhaust for venting pressure tank system or media cabinet necessary"

Dies ist ein kundenspezifisches Produkt bei dem eine sehr hohe Anzahl an Optionen zur Verfügung steht. Bitte kontaktieren Sie unseren Vertrieb für weitere Informationen und Unterstützung um ein auf Ihre Bedürfnisse angepasstes Produkt zu erhalten.

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